Making Sense of the Lithography Landscape: Cost and Productivity Issues Below 14nm and the Path(s) to 5nm 

Wednesday, July 15
10:00am-12:30pm
Moscone North, Hall E, Room 133

 

No one denies that the road to EUVL has been bumpy – but progress has been made on several fronts, including source technology. In the meantime, the industry has used all of its prowess to do what it must to extend optical lithography, as well as to continue developing alternative and/or adjunct lithography technologies (e.g., nanoimprint, DSA, etc.). Two common themes that pervade each of the aforementioned choices are cost and productivity. Still another challenge – particularly for EUVL – is developing the infrastructure necessary to support high-volume manufacturing (HVM). This session will look at lithography cost and productivity issues as the industry goes below 14nm, and examine infrastructure build-out.

 

 

Scaling Transistors: HVM Solutions Below 14nm; Getting to 5nm

Wednesday, July 15
2:00pm-4:30pm
Moscone North, Hall E, Room 133

 

The semiconductor industry is at an inflection point with increased consolidation, risk and cost, at each technology node.   This STS will explore strategies used by micro-electronics supply chain providers to expand into adjacent markets.  Sessions will include speakers from the semiconductor supply chain that have successfully penetrated emerging opportunities such as healthcare, photovoltaics, power electronics, sensors, and photonics.

 

Please check back frequently for updates and more information as agendas develop and speakers are announced.

 

 

Registration  

 

For more information about other STS Sessions, Click STS Sessions

 



        By June 5               Starting June 6        
Member (Day Pass)       
$196   $262
Non Member (Day Pass)
$262    $349


 

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