Day pass includes afternoon session:

Scaling Transistors: HVM Solutions Below 14nm; Getting to 5nm


Making Sense of the Lithography Landscape: Cost and Productivity Issues Below 14nm and the Path(s) to 5nm


Wednesday, July 15
Moscone North, Hall E, Room 133


No one denies that the road to EUVL has been bumpy – but progress has been made on several fronts, including source technology. In the meantime, the industry has used all of its prowess to do what it must to extend optical lithography, as well as to continue developing alternative and/or adjunct lithography technologies (e.g., nanoimprint, DSA, etc.). Two common themes that pervade each of the aforementioned choices are cost and productivity. Still another challenge – particularly for EUVL – is developing the infrastructure necessary to support high-volume manufacturing (HVM). This session will look at lithography cost and productivity issues as the industry goes below 14nm, and examine infrastructure build-out.



Welcome and Introduction

Debra Vogler (Biography)

President & Founder

Instant Insight Inc.


193 Immersion Lithography at the 10nm node and Beyond


Stephen Renwick, Ph.D. (Biography)
Director of Computational Imaging
Nikon Research Corporation of America


Industrialization of EUV Lithography: Progress Update


Mike Lercel, Ph.D. (Biography)
Director, Product Marketing


From pitch (low k1) Scale to Cost Scale for Multiple
Patterning Generations


Jongwook Kye (Biography)
Director of Strategic Lithography Technology Group


Nanoimprint System Development and Status for
High Volume Semiconductor Manufacturing


Doug Resnick (Biography)
VP, Marketing & Business Development
Canon Nanotechnologies

11:25am-11:45am Christopher Progler, Ph.D.(Biography)
Chief Technology Officer & Strategic Planning

HVM Metrology Needs Toward the 5 nm Node


Ben Bunday (Biography)
Project Manager, CD Metrology, Sr. Member Technical Staff


The Leverage of Lithography Alternatives to
Address High-end Technology Roadmap


Laurent Pain, Ph.D. (Biography)

Patterning Program Manager – Business development

Silicon Technologies Division (DTSI)

CEA Leti

12:25pm-12:30pm Closing Remarks
 Debra Vogler,

President & Founder, Instant Insight Inc.

Session Moderator:  Debra Vogler,

President & Founder, Instant Insight Inc.





For more information about other STS Sessions, Click STS Sessions


        By June 5               Starting June 6        
Member (Day Pass)       
  $196   $262
Non Member (Day Pass)
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