Day pass includes afternoon session:

Scaling Transistors: HVM Solutions Below 14nm; Getting to 5nm

 

Making Sense of the Lithography Landscape: Cost and Productivity Issues Below 14nm and the Path(s) to 5nm

 

Wednesday, July 15
10:00am-12:30pm
Moscone North, Hall E, Room 133

 

No one denies that the road to EUVL has been bumpy – but progress has been made on several fronts, including source technology. In the meantime, the industry has used all of its prowess to do what it must to extend optical lithography, as well as to continue developing alternative and/or adjunct lithography technologies (e.g., nanoimprint, DSA, etc.). Two common themes that pervade each of the aforementioned choices are cost and productivity. Still another challenge – particularly for EUVL – is developing the infrastructure necessary to support high-volume manufacturing (HVM). This session will look at lithography cost and productivity issues as the industry goes below 14nm, and examine infrastructure build-out.

 

Agenda

10:00am-10:05am  
Welcome and Introduction

Debra Vogler (Biography)

President & Founder

Instant Insight Inc.

 
10:05am-10:25am     

193 Immersion Lithography at the 10nm node and Beyond

 

Stephen Renwick, Ph.D. (Biography)
Director of Computational Imaging
Nikon Research Corporation of America

 
10;25am-10:45am

Industrialization of EUV Lithography: Progress Update

 

Mike Lercel, Ph.D. (Biography)
Director, Product Marketing
ASML
 

   
10:45am-11:05am

From pitch (low k1) Scale to Cost Scale for Multiple
Patterning Generations

 

Jongwook Kye (Biography)
Director of Strategic Lithography Technology Group
GLOBALFOUNDRIES

 
11:05am-11:25am   

Nanoimprint System Development and Status for
High Volume Semiconductor Manufacturing

 

Doug Resnick (Biography)
VP, Marketing & Business Development
Canon Nanotechnologies

 
11:25am-11:45am Christopher Progler, Ph.D.(Biography)
Chief Technology Officer & Strategic Planning
Photronics
   
11:45am-12:05pm

HVM Metrology Needs Toward the 5 nm Node

 

Ben Bunday (Biography)
Project Manager, CD Metrology, Sr. Member Technical Staff
Sematech

 
12:05pm-12:25pm

The Leverage of Lithography Alternatives to
Address High-end Technology Roadmap

 

Laurent Pain, Ph.D. (Biography)

Patterning Program Manager – Business development

Silicon Technologies Division (DTSI)

CEA Leti

   
12:25pm-12:30pm Closing Remarks
 Debra Vogler,

President & Founder, Instant Insight Inc.

   
Session Moderator:  Debra Vogler,

President & Founder, Instant Insight Inc.

 

 

Registration  

 

For more information about other STS Sessions, Click STS Sessions

 



        By June 5               Starting June 6        
Member (Day Pass)       
  $196   $262
Non Member (Day Pass)
  $262    $349


 

How to Register for this Program

 

Start a New Registration


Upgrade Your Existing Registration


Begin a new registration record and select this and any other programs you wish to attend.              

If you are already registered for SEMICON West, visit www.semiconwest.org/rrc  to log in to the Registration Resource Center.  Select "Agenda Builder" to add this program.






Quick Tip: Onsite Registration Management with Your Mobile Device  

Use the Registration Resource Center (www.semiconwest.org/rrc) on your mobile device or from the SEMICON West Mobile App (available June) during the show to manage your programs. You are no longer required to go to the registration areas to manage your schedule.

Bookmark and Share Google+